Figure 9:
(a) Dependence of XRD profiles for Sapp.//[Mn(0.7)/Si(2.2)]
48
annealed at 800°C in Ar + 3% H
2
atmosphere on annealing time
t
a
. (b) Depen-dence of S on
t
a
. (c) Dependence of ρ on
t
a
.
